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Origin of Initial Current Peak in High Power Impulse Magnetron Sputtering and Verification by Non-Sputtering Discharge

吴忠振  肖舒  崔岁寒  傅劲裕  田修波  朱剑豪  潘锋  
【摘要】:A non-sputtering discharge is utilized to verify the effect of replacement of gas ions by metallic ions and consequent decrease in the secondary electron emission coefficient in the discharge current curves in high-power impulse magnetron sputtering(HiPIMS).In the non-sputtering discharge involving hydrogen,replacement of ions is avoided while the rarefaction still contributes.The initial peak and ensuing decay disappear and all the discharge current curves show a similar feature as the HiPIMS discharge of materials with low sputtering yields such as carbon.The results demonstrate the key effect of ion replacement during sputtering.

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